Importance of skin resistance in the reverse iontophoresis-based non-invasive glucose monitoring system

D. W. Kim, H. S. Kim, D. H. Lee, Hee Chan Kim

Research output: Contribution to journalConference articleResearchpeer-review

9 Citations (Scopus)

Abstract

Utilization of the changes in skin resistance during reverse iontophoresis is proposed to detect severe perspiration as well as to correct the glucose estimation. Developed system consists of the amperometric biosensor unit, the electrode unit, a constant current driver circuit and a microcontroller-based control. Performance of the developed system was evaluated by the in-vitro skin model which was specially designed for resverse iontophoresis system.

Original languageEnglish
Pages (from-to)2434-2437
Number of pages4
JournalAnnual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings
Volume26 IV
StatePublished - 1 Dec 2004
EventConference Proceedings - 26th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, EMBC 2004 - San Francisco, CA, United States
Duration: 1 Sep 20045 Sep 2004

Fingerprint

Iontophoresis
Glucose
Skin
Monitoring
Biosensing Techniques
Microcontrollers
Biosensors
Electrodes
Networks (circuits)
In Vitro Techniques

Keywords

  • Glucose monitoring system
  • Non-invasive
  • Reverse Iontophoresis
  • Skin Resistance

Cite this

@article{32325ad9246441268648d8c4e53fba45,
title = "Importance of skin resistance in the reverse iontophoresis-based non-invasive glucose monitoring system",
abstract = "Utilization of the changes in skin resistance during reverse iontophoresis is proposed to detect severe perspiration as well as to correct the glucose estimation. Developed system consists of the amperometric biosensor unit, the electrode unit, a constant current driver circuit and a microcontroller-based control. Performance of the developed system was evaluated by the in-vitro skin model which was specially designed for resverse iontophoresis system.",
keywords = "Glucose monitoring system, Non-invasive, Reverse Iontophoresis, Skin Resistance",
author = "Kim, {D. W.} and Kim, {H. S.} and Lee, {D. H.} and Kim, {Hee Chan}",
year = "2004",
month = "12",
day = "1",
language = "English",
volume = "26 IV",
pages = "2434--2437",
journal = "Annual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings",
issn = "0589-1019",
publisher = "Institute of Electrical and Electronics Engineers Inc.",

}

Importance of skin resistance in the reverse iontophoresis-based non-invasive glucose monitoring system. / Kim, D. W.; Kim, H. S.; Lee, D. H.; Kim, Hee Chan.

In: Annual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings, Vol. 26 IV, 01.12.2004, p. 2434-2437.

Research output: Contribution to journalConference articleResearchpeer-review

TY - JOUR

T1 - Importance of skin resistance in the reverse iontophoresis-based non-invasive glucose monitoring system

AU - Kim, D. W.

AU - Kim, H. S.

AU - Lee, D. H.

AU - Kim, Hee Chan

PY - 2004/12/1

Y1 - 2004/12/1

N2 - Utilization of the changes in skin resistance during reverse iontophoresis is proposed to detect severe perspiration as well as to correct the glucose estimation. Developed system consists of the amperometric biosensor unit, the electrode unit, a constant current driver circuit and a microcontroller-based control. Performance of the developed system was evaluated by the in-vitro skin model which was specially designed for resverse iontophoresis system.

AB - Utilization of the changes in skin resistance during reverse iontophoresis is proposed to detect severe perspiration as well as to correct the glucose estimation. Developed system consists of the amperometric biosensor unit, the electrode unit, a constant current driver circuit and a microcontroller-based control. Performance of the developed system was evaluated by the in-vitro skin model which was specially designed for resverse iontophoresis system.

KW - Glucose monitoring system

KW - Non-invasive

KW - Reverse Iontophoresis

KW - Skin Resistance

UR - http://www.scopus.com/inward/record.url?scp=11144300897&partnerID=8YFLogxK

M3 - Conference article

VL - 26 IV

SP - 2434

EP - 2437

JO - Annual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings

JF - Annual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings

SN - 0589-1019

ER -